| TiNi-based thin films for MEMS applications (2003) | |||||||||||||
Abstract | |||||||||||||
| In this paper, some critical issues and problems in the development of TiNi thin films were discussed, including preparation and characterization considerations, residual stress and adhesion, frequency improvement, fatigue and stability, as well as functionally graded or composite thin film design. Different types of MEMS applications were reviewed and the prospects for future advances in fabrication process and device development were discussed.. Singapore-MIT Alliance (SMA) | |||||||||||||
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