| LPVD - fundamentals of material removal and transfer (1992) | |||||||||||
Abstract | |||||||||||
| The removal and the transfer of target materials, as the most important, physical processes in LPVD highly dominating the thin film formation on substrates, are investigated as a function of laser parameters and processing variables. The removal of the target material was measured by a microbalance, the transfer by emission vapour/plasma states are observed which are used in combination with the geometrical arrangement of target and substrate to generate various film structures in view of applications. | |||||||||||
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