Publikationsansicht

A ThreeDimensional High-Throughput Architecture Using Through-Wafer Optical Interconnect (1995)

Abstract
Abstract-This paper presents a three-dimensional, highly par-allel, optically interconnected system to process high-throughput stream data such as images. The vertical optical interconnections are realized using integrated optoelectronic devices operating at wavelengths to which silicon is transparent. These through-wafer optical signals are used to vertically optically interconnect stacked silicon circuits. The thin film optoelectronic devices are bonded directly to the stacked layers of silicon circuitry to realize self-contained vertical optical interconnections. Each integrated circuit layer contains analog interface circuitry, namely, detector amplifier and emitter driver circuitry, and digital circuitry for the network and/or processor, all of which are fabricated using a standard silicon integrated circuit foundry. These silicon circuits are post processed to integrate the thin film optoelectronics using standard, low cost, high yield microfabrication techniques. The three-dimensionally integrated architectures described herein are a network and a processor. The network has been designed to meet off-chip U 0 using a new offset cube topology coupled with naming and routing schemes. The performance of this network is comparable to that of a three-dimensional mesh. The processing architecture has been defined to minimize overhead for basic parallel operations. The system goal for this research is to develop an integrated processing node for high-throughput, low-memory applications. I.

Details der Publikation
Download http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.67.4053
Quelle http://www.ece.gatech.edu/research/labs/pica/pdf/Wills95-JLT.pdf
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Typ text
Sprache Englisch
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