UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale (2009)
Schmitt, H.,
Amon, B.,
Beuer, S.,
Petersen, S.,
Rommel, M.,
Bauer, A.J.,
...
Imprint specific process parameters like the residual layer thickness and the etch resistance of the UV polymers for the substrate etch process have to be optimized to introduce UV nanoimprint...
Transmission-electron-microscopy observation of Pt pillar fabricated by electron-beam-induced deposition (2009)
Murakami, K.,
Matsubara, N.,
Ichikawa, S.,
Kisa, T.,
Nakayama, T.,
Takamoto, K.,
...
Pt pillars with a waist size of 20 nm and a length of 300 nm were fabricated by electron-beam-induced deposition and characterized by transmission electron microscopy before and after annealing or...
Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing: Poster at the MNE 2009, 35th International Conference on Micro and Nano Engineering, Ghent, Belgium (2009)
Jambreck, J.D.,
Schmitt, H.,
Amon, B.,
Rommel, M.,
Bauer, A.J.,
Frey, L.
Fabrication of metallic SPM tips by combining UV nanoimprint lithography and focused ion beam processing: Poster at the MNE 2009, 35th International Conference on Micro and Nano Engineering, Ghent, Belgium (2009)
Jambreck, J.D.,
Schmitt, H.,
Amon, B.,
Rommel, M.,
Bauer, A.J.,
Frey, L.
Recent improvements in the integration of field emitters into scanning probe microscopy sensors (2008)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Recent improvements in the fabrication of integrated field emitters with a control electrode into scanning probe microscopy sensors are presented and discussed. Compared to earlier work the precursor...
Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)
Yanev, V.,
Rommel, M.,
Lemberger, M.,
Petersen, S.,
Amon, B.,
Erlbacher, T.,
...
UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale: Poster at MNE 2008, 34th International Conference on Micro and Nano Engineering, Athens, Greece (2008)
Schmitt, H.,
Amon, B.,
Petersen, S.,
Rommel, M.,
Bauer, A.J.,
Ryssel, H.
UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale: Poster at MNE 2008, 34th International Conference on Micro and Nano Engineering, Athens, Greece (2008)
Schmitt, H.,
Amon, B.,
Petersen, S.,
Rommel, M.,
Bauer, A.J.,
Ryssel, H.
Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)
Yanev, V.,
Rommel, M.,
Lemberger, M.,
Petersen, S.,
Amon, B.,
Erlbacher, T.,
...
High-k dielectric layers (HfSixOy and ZrO2) with different film morphologies were investigated by tunneling atomic-force microscopy (TUNA). Different current distributions were observed for amorphous...
Electrical AFM techniques for the advanced characterization of materials in semiconductor technology: Poster at NanoScale VI, Berlin, Germany, July 9-11, 2008 (2008)
Yanev, V.,
Rommel, M.,
Spoldi, G.,
Beuer, S.,
Amon, B.,
Petersen, S.,
...
Electrical AFM techniques for the advanced characterization of materials in semiconductor technology: Poster at NanoScale VI, Berlin, Germany, July 9-11, 2008 (2008)
Yanev, V.,
Rommel, M.,
Spoldi, G.,
Beuer, S.,
Amon, B.,
Petersen, S.,
...
Recent improvements in the integration of field emitters into scanning probe microscopy sensors: Poster at MNE 2007, 33rd International Conference on Micro- and Nano-Engineering 2007, Copenhagen, Denmark (2007)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Recent improvements in the integration of field emitters into scanning probe microscopy sensors: Poster at MNE 2007, 33rd International Conference on Micro- and Nano-Engineering 2007, Copenhagen, Denmark (2007)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Emissions of NH3, N2O and CH4 from a tying stall for milking cows, during storage of farmyard manure and after spreading (1999)
Amon, B.,
Amon, T.,
Boxberger, J.,
Pollinger, A.
At the Institute of Agricultural and Environmental Engineering (ILUET) emission measurements are carried out with the aim to find factors influencing the amount of emissions and means to reduce...
Emissions of NH3, N2O and CH4 from composted and anaerobically stored farmyard manure (1999)
Amon, B.,
Amon, T.,
Boxberger, J.,
Pollinger, A.
A large open-dynamic-chamber has been developed and is now used to asses the emissions from all sectors of animal husbandry. It covers an area of 27 m2 and can be built up over different emitting...
Methods for measuring emissions from agrarian sources: FTIR measurement techniques with white-cell, large chamber or open-path (1997)
Amon, B.,
Boxberger, J.,
Amon, T.,
Gronauer, A.,
Depta, G.,
Neser, S.,
...