D. Biro

Details der Publikationsliste

Zeitraum

1996 - 2009

Anzahl

40

Co-Autoren

Industrially feasible multi-crystalline metal wrap through (MWT) silicon solar cells exceeding 16% efficiency (2009)

Clement, F., Menkoe, M., Kubera, T., Harmel, C., Hoenig, R., Wolke, W., ...

On the way to higher efficiencies, back contact solar cells seem to be a promising alternative to the conventional screen-printed solar cells. Especially, the metal wrap through (MWT) solar cell...

Microscopic homogeneity of emitters formed on textured silicon using in-line diffusion and phosphoric acid as the dopant source (2009)

Voyer, C., Buettner, T., Bock, R., Biro, D., Preu, R.

An important point of comparison between POCl3 emitter diffusion in a quartz tube furnace and in-line diffusion using sprayed phosphoric acid is the microscopic homogeneity of the diffusion, i.e. the...

Verfahren und Vorrichtung zum Strukturieren einer Oberflaechenschicht (2007)

Kray, D., Biro, D., Mette, A.

DE 102006003606 A1 UPAB: 20070924 NOVELTY - Method for structuring a surface layer (9) on a substrate (8) comprises guiding a liquid jet (6) directed onto the surface layer over the regions of the...

Textur- und Reinigungsmedium zur Oberflaechenbehandlung von Wafern und dessen Verwendung (2007)

Mayer, K., Schumann, M., Kray, D., Orellana Peres, T., Rentsch, J., Zimmer, M., ...

DE 102007058829 A1 UPAB: 20090619 NOVELTY - A water-based texture- and cleaning agent is employed to treat the surface mono-crystalline wafers. The agent incorporates one or more alkaline etching...

Dotiergermisch fuer die Dotierung von Halbleitern (2006)

Biro, D., Voyer, C., Wanka, H., Koriath, J.

DE1005025933 B UPAB: 20060727 NOVELTY - Doping mixture (A), for semiconductor doping, comprises at least one p- or n-dopant, for doping a semiconductor surface, water and mixture of two or more...

Verfahren zur simultanen Dotierung und Oxidation von Halbleitersubstraten und dessen Verwendung (2006)

Biro, D., Preu, R., Rentsch, J.

WO 2008028625 A2 UPAB: 20080417 NOVELTY - The method involves coating a surface area of a semiconductor substrate with a layer (3) of doping material, which comprises amorphous silicon, silicon...

Transportvorrichtung mit speziellen Kettengliedern zum Transport von zu prozessierenden Elementen durch eine Temperaturzone (2005)

Biro, D., Gentischer, J.

DE1004019950 A UPAB: 20051216 NOVELTY - The conveyor for transporting semiconductor wafers through high temperature zones comprises a chain made from ceramic links (5). These are directly connected,...

Fast, contactless and spatially resolved measurement of sheet resistance by an infrared method (2004)

Isenberg, J., Biro, D., Warta, W.

The principle of free carrier absorption in combination with a CCD camera sensitive in the infrared is used to establish a measurement method for the emitter sheet resistance of silicon solar cells....

Advanced diffusion system for low contamination in-line rapid thermal processing of silicon solar cells (2002)

Biro, D., Preu, R., Schultz, O., Peters, S., Huljic, D.M., Zickermann, D., ...

A novel diffusion system for in-line rapid thermal diffusion is presented. The lamp-heated furnace has a low thermal mass and a metal free transport system based on the walking beam principle. The...

Transportvorrichtung und Verfahren zum Transport von zu prozessierenden Elementen durch eine Hochtemperaturzone (2002)

Biro, D., Wandel, G., Lenz, R., Voelk, P.

DE 10059777 A UPAB: 20020621 NOVELTY - The device has at least one pair of parallel bearer elements extending in the transport direction and at least one drive mechanism producing a repetitive lift...

Rapid Thermal Firing of Screen Printed Contacts for Large Area Crystalline Silicon Solar Cells (2000)

Huljic, D.M., Biro, D., Preu, R., Craff-Castillo, C., Lüdemann, R.

Rapid Thermal Firing (RTF), i.e. firing of screen printed contacts using Rapid Thermal Processing (RTP), is a promising alternative compared to infrared heated conveyor belt furnaces concerning a...

Sputtering - a key technology for thin film coatings in crystalline silicon solar cell production? (2000)

Preu, R., Krempel-Hesse, J., Biro, D., Huljic, D.M., Mäckel, H., Lüdemann, R.

The novel sputter source TwinMag is used to deposit silicon nitride as an antire flection layer for crystalline silicon solar cells. TwinMag consists of two pl anar magnetrons, standing side by side...

Printed interdigitated front side metallisation for c-Si thin film solar cells: Three industrially applicable concepts (2000)

Huljic, D.M., Schäfer, S., Biro, D., Emanuel, G., Lüdemann, R.

Thin crystalline silicon layers deposited on inexpensive substrates present a pr omising approach to achieve noticeably lower manufacturing costs compared to w afer technology. In contrast to...

Solarzelle und Verfahren zu deren Herstellung (2000)

Warta, W., Biro, D.

DE 19857064 A UPAB: 20000823 NOVELTY - Passivation of the surface of a semiconductor material, optionally covered with natural semiconductor oxide, involves treating the surface with a passivating...