Properties of plasma-enhanced atomic layer deposition-grown tantalum carbonitride thin films (2009)
Hossbach, C., Teichert, S., Thomas, J., Wilde, L., Wojcik, H., Schmidt, D., ...
Tantalum carbonitride thin films were deposited by plasma-enhanced atomic layer deposition using the metallorganic precursor tert-butylimido tris (diethylamido) tantalum and hydrogen/argon direct...