A spatially resolving detector for the extreme ultraviolet (XUV) and soft x-ray spectral region is presented. Principle of operation is conversion of XUV radiation to visible light by a scintillator...
Extreme ultraviolet plasma source for future lithography (2008)
Wagenaars, E., Mader, A., Bergmann, K., Jonkers, J., Neff, W.
An extreme ultraviolet (EUV) plasma source intended for future lithography applications is presented. The plasma source efficiently emits EUV light around 13.5 nm with 2% bandwidth. Debris mitigation...
Thermal and optical characterization of collectors integrated in an Sn-DPP based SoCoMo (2008)
Bianucci, G., Brunton, A., Cassol, G.L., Pirovano, G., Zocchi, F., Mader, A., ...
Vorrichtung und Verfahren fuer die XUV-Mikroskopie (2007)
Juschkin, L., Bergmann, K., Neff, W.
DE 102007041939 A1 UPAB: 20090323 NOVELTY - The optical imaging system, for extreme UV (XUV) microscopy, has an initial enlargement stage (1',1') giving an intermediate image (5) of at least part of...
Integrating Philips' extreme UV source in the alpha-tools (2005)
Pankert, J., Apetz, R., Bergmann, K., Derra, G., Janssen, M., Jonkers, J., ...
Progress on EUV-source development, tool integration and applications (2005)
Lebert, R., Jaegle, B., Wies, C., Stamm, U., Kleinschmidt, J., Gaebel, K., ...
Vorrichtung zur Erzeugung von EUV- und weicher Roentgenstrahlung (2005)
WO2005015602 A UPAB: 20050324 NOVELTY - The gas discharge source has a gas-filled intermediate space (3) between 2 electrodes (1,2), with devices for supplying and extracting gas to and from this...
Bergmann, K., Rosier, O., Metzmacher, C.
A grazing incidence reflectometer operating in the extreme ultraviolet (EUV) spectral range around 13.5 nm is presented which is making use of a compact xenon pinch plasma light source. The apparatus...
Gasentladungslampe fuer EUV-Strahlung (2005)
Neff, W., Bergmann, K., Jonkers, J., Pankert, J., Derra, G.
WO2004051698 A UPAB: 20040720 NOVELTY - The longitudinal axes (5, 5') of the hollow cathode openings (3), have a common point of intersection (S) lying on the anode opening (4) axis of symmetry (6)....
Multilayer optics development of EUV microscopy (2005)
Braun, S., Foltyn, T., Loyen, L. Van, Leson, A., Walter, K., Bergmann, K., ...
Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography (2004)
Krücken, T., Bergmann, K., Juschkin, L., Lebert, R.
Future extreme ultraviolet (EUV) lithography will require high radiation intensities at a wavelength around 13.5 nm. The limits of emission in this spectral range from discharge based plasmas are...
Rosier, O., Apetz, R., Bergmann, K., Jonkers, J., Wester, R., Neff, W., ...
The hollow-cathode triggered discharge extreme ultraviolet source is based on the same principle as pseudospark switches. The electrode geometry consists of a planar anode and cathode with central...
Lebert, R., Wies, C., Juschkin, L., Jägle, B., Neff, W., Barthel, J., ...
Both, microscopic and analytic techniques using light (IR, VIS, UV) or X-rays reach their limits when dealing with mesoscopic or nanoscale samples. Conventional instrumentation for nanotechnology do...
Lebert, R., Jägle, B., Juschkin, L., Wies, C., Neff, W., Barthel, J., ...
DE 10238096 B UPAB: 20040305 NOVELTY - The gas discharge lamp has at least 2 electrodes (1,2) for generation of a radiation emission plasma (8) in a discharge space (6) between them, one of the...
Design and development of an optical system for EUV-microscopy (2004)
Foltyn, T., Braun, S., Gawlitza, P., Leson, A., Bergmann, K., Neff, W., ...
Neff, W., Lebert, R., Bergmann, K.
WO 200101736 A UPAB: 20010910 NOVELTY - The radiation source uses gas discharge within a gas-filled space (7) between 2 main electrodes (1,2), each provided with an opening (3,8) lying along a...
Physical properties of the HCT EUV source (2003)
Pankert, J., Bergmann, K., Klein, J., Neff, W., Rosier, O., Seiwert, S., ...
The paper describes recent progress on the development of an EUV source based on a hollow cathode triggered gas discharge (HCT). The principle of operation has been described in previous...
Analytical study of four-wave mixing with large atomic coherence (2002)
Korsunsky, E. A., Halfmann, T., Marangos, J. P., Bergmann, K.
Four-wave mixing in resonant atomic vapors based on maximum coherence induced by Stark-chirped rapid adiabatic passage (SCRAP) is investigated theoretically. We show the advantages of a coupling...
Klein, J., Neff, W., Seiwert, S., Bergmann, K.
EP 1248499 A UPAB: 20030124 NOVELTY - A discharge area (10) of pre-determined gas pressure and two electrodes (11,12) each have an opening set up on the same symmetrical axis (13) and form a plasma...
Neff, W., Bergmann, K., Pankert, J., Rosier, O.
DE 10134033 A UPAB: 20030129 NOVELTY - The method involves using a gas discharge in a discharge vessel (11) with two electrodes held at high voltage with a gas filling at predefined pressure in a...
Fleischhauer, M., Unanyan, R., Shore, B.W., Bergmann, K.
Abstract: We show that the physical mechanism of population transfer in a 3-level system with a closed loop of coherent couplings (loop-STIRAP) is not equivalent to an adiabatic rotation of the...
Measuring a coherent superposition (2001)
Bergmann, K., Vitanov, N.V., Shore, B.W., Unanyan, R.G.
Abstract: We propose a simple method for measuring the populations and the relative phase in a coherent superposition of two atomic states. The method is based on coupling the two states to a third...
Photoionization Suppression by Continuum Coherence: Experiment and Theory (2001)
Yatsenko, L.P., Halfmann, T., Shore, B.W., Bergmann, K.
Abstract: We present experimental and theoretical results of a detailed study of laser-induced continuum structures (LICS) in the photoionization continuum of helium out of the metastable state 2s^1...
Coherent properties of a tripod system coupled via a continuum (2001)
Bergmann, K., Unanyan, R. G., Vitanov, N.V., Shore, B. W.
We present results from a study of the coherence properties of a system involving three discrete states coupled to each other by two-photon processes via a common continuum. This tripod linkage is an...
A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography (2001)
Bergmann, K., Rosier, O., Lebert, R., Neff, W., Poprawe, R.
A pinch plasma source in the extreme ultraviolet is presented where the special design of the electrodes leads to advantages concerning low erosive operation and an effective coupling of the...
Pinch plasma radiation sources for the extreme ultraviolet (2001)
Neff, W., Bergmann, K., Rosier, O., Lebert, R., Juschkin, L.
Extreme ultraviolet lithography (EUVL) is under discussion to be implemented in the production of chips as early as 2005 to 2007 for reducing structures in semiconductor devices to below 70 mn. The...
Preliminary results from key experiments on sources for EUV lithography (2001)
Lebert, R., Aschke, L., Bergmann, K., Dusterer, S., Gabel, K., Hoffmann, D., ...
While huge progress has been achieved for EUVL system design and multilayer optics during the last years the decision on the best suited source is still open. In a German basic research cooperation...
Schriever, G., Rahe, M., Neff, W., Bergmann, K., Lebert, R., Lauth, H., ...
Extreme ultraviolet (EUV) lithography tools will need a debris free source with a collectable radiation power of about 40 W to fulfill the prerequisites for an economical wafer throughput up to 80...
Extreme-ultraviolet source development: a comparison of different concepts (2000)
Schriever, G., Rahe, M., Rebhan, M., Basting, D., Walecki, W.J., Lauth, H., ...
We discuss the results of the studies of Z-pinch sources for photolithographic applications developed by Lambda Physik. We also report the results of fundamental investigations pursued by...
Electrode phenomena and lifetime consideration in a radial multichannel pseudospark switch (2000)
Bergmann, K., Müller, M., Reichartz, D., Neff, W., Lebert, R.
A radial multichannel pseudospark switch for pulsed power applications with pulsed currents of more than 100 kA, hold-off voltage up to 30 kV, and pulse durations (full-width at half maximum (FWHM))...
Bergmann, K., Rosier, O., Neff, W., Lebert, R.
An extreme-ultraviolet radiation source based on a xenon pinch plasma is discussed with respect to the demands on a radiation source for extreme-ultraviolet lithography. Operation of the discharge in...
Verfahren zur Erzeugung von Ultraviolettstrahlung (2000)
Lebert, R., Neff, W., Engel, A., Bergmann, K.
DE 19922566 A UPAB: 20000823 NOVELTY - The method involves the use of a plasma (7) as the radiation emitting medium. The plasma is produced with a pulsed high current discharge and propagates along...
Verfahren der Roentgenfluoreszenzmikroskopie (2000)
Neff, W., Rothweiler, D., Lebert, R., Bergmann, K., Boebel, F.G., Hanke, R.F.
X-ray fluorescence microscopy process in which a pulsed pinched plasma is excited by laser to produce X-rays (11) to analyse a sample (12) having at least one chemical element. X- ray fluorescent...
Coherent properties of a tripod system coupled via a continuum (1999)
Unanyan, R. G., Vitanov, N. V., Shore, B. W., Bergmann, K.
We present results from a study of the coherence properties of a system involving three discrete states coupled to each other by two-photon processes via a common continuum. This tripod linkage is an...
Measuring a coherent superposition (1999)
Vitanov, N. V., Shore, B. W., Unanyan, R. G., Bergmann, K.
We propose a simple method for measuring the populations and the relative phase in a coherent superposition of two atomic states. The method is based on coupling the two states to a third common...
Photoionization Suppression by Continuum Coherence: Experiment and Theory (1999)
Yatsenko, L. P., Halfmann, T., Shore, B. W., Bergmann, K.
We present experimental and theoretical results of a detailed study of laser-induced continuum structures (LICS) in the photoionization continuum of helium out of the metastable state 2s $^1S_0$. The...
Extreme ultraviolet emission of laser-produced plasmas using a cryogenic xenon target (1999)
Schriever, G., Bergmann, K., Lebert, R.
In this article we show that laser-produced plasmas using a cryogenic xenon target are emitters of pulsed broadband extreme ultraviolet radiation with an intensity maximum around 11 nm. The photon...
Vorrichtung zum Schalten von elektrischen Stroemen hoher Stromstaerken (1999)
Neff, W., Kiefer, J., Lebert, R., Bergmann, K.
the arrangement has at least one anode (10) and a cathode (11) which are arranged at a constant distance apart to form an intermediate vol. A cathode vol. (12) bounding on the cathode has at least...
Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma (1999)
Bergmann, K., Schriever, G., Rosier, O., Müller, M., Neff, W., Lebert, R.
An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode...
A gas discharged based radiation source for EUV-lithography (1999)
Lebert, R., Bergmann, K., Schriever, G., Neff, W.
A new high repetitive, compact and low cost gas discharge based EUV "lamp" has been studied as an alternative to laser-produced plasmas as EUV sources. First results using oxygen in a fast discharge...
Comparison of laser produced and gas discharge based EUV sources for different applications (1999)
Lebert, R., Bergmann, K., Schriever, G., Neff, W.
Pulsed plasmas, e.g., laser produced plasma (LPP) and gas discharge based pinch plasmas are known as intense sources of soft x-ray and extreme ultraviolet (EUV) radiation in the wavelength interval...
Fleischhauer, M., Unanyan, R., Shore, B. W., Bergmann, K.
We show that the physical mechanism of population transfer in a 3-level system with a closed loop of coherent couplings (loop-STIRAP) is not equivalent to an adiabatic rotation of the dark-state of...
A radial multichannel pseudospark switch for high voltage and high current applications (1998)
Bergmann, K., Müller, M., Neff, W., Lebert, R.
A radial multichannel pseudospark switch with a special geometry is discussed. This geometry allows low erosive operation for pulsed currents with peak amplitudes of more than 100 kA, a pulse...
Schriever, G., Bergmann, K., Lebert, R.
The extreme ultraviolet radiation emitted from a plasma generated by a pulsed Nd:yttrium aluminum garnet laser is investigated around 13 nm wavelength for several low Z elements (lithium, nitrogen,...
Schriever, G., Mager, S., Naweed, A., Engel, A., Bergmann, K., Lebert, R.
Extended ultraviolet (EUV) emission characteristics of a laser-produced lithium plasma are determined with regard to the requirements of x-ray photoelectron spectroscopy. The main features of...
Electrode phenomena and current distribution in a radial multichannel pseudospark switch (1998)
Bergmann, K., Kiefer, J., Gavrilescu, C., Neff, W., Lebert, R.
The microscopic structure and the spatial distribution of the cathode spots in a radial multichannel pseudospark switch have been investigated by means of scanning electron microscopy. Current pulses...
Bergmann, K., Lebert, R., Kiefer, J., Neff, W.
The electron emission from a field emission trigger unit was matched to the requirements for the simultaneous ignition of all channels in a radial multichannel pseudospark switch for a large...
Spectroscopic investigation of highly transient pinch plasmas (1997)
Bergmann, K., Rosmej, O.N., Rosmej, F.B., Engel, A., Gavrilescu, C., Neff, W., ...
The temporal evolution of neon pinch plasmas, generated in a 2kJ plasma focus device, has been investigated by x-ray spectroscopic methods for two sets of device parameters. These two sets lead to...
Scaling of the K-shell line emission in transient pinch plasmas (1997)
Bergmann, K., Lebert, R., Neff, W.
The scaling of the K-shell line emission of intermediate-valued atomic number pinch plasmas, generated in a plasma focus device, is investigated for currents ranging between 180 kA and 310 kA a...
Bergmann, K., Lebert, R., Neff, W.
The transient dynamics in pinch plasmas generated in a small plasma focus device has been made visible in the scaling of the brilliance of helium- and hydrogen-like resonance lines. The scaling of...
Compact plasma focus devices: Flexible laboratory sources for applications (1997)
Lebert, R., Engel, A., Bergmann, K., Treichel, O., Gavrilescu, C., Neff, W.
Small pinch plasma devices are intense sources of pulsed XUV-radiation. Because of their low costs and their compact sizes pinch plasmas seem well suited to supplement research ac- tivities based on...
Pinch plasmas as intensive EUV sources for laboratory applications (1996)
Lebert, R., Rothweiler, D., Engel, A., Bergmann, K., Neff, W.
Compact pinch plasma devices are intense sources of pulsed EUV radiation with output energies of several joules per pulse in single lines. Their spectrum peaks in a wavelength range where...
Ford, T.W., Page, A.M., Rondot, S., Lebert, R., Bergmann, K., Neff, W., ...
The use of high energy lasers for generating plasmas for soft X-ray contact microscopy (SXCM) of living biological specimens is now well established. However, such systems are only available at...
Yield optimization of the Lyman-alpha emission in pinch plasmas (1995)
The scaling of the x-ray yield into a single K-shell line per pulse is discussed for pinch plasma devices. The determining parameters are the current /o through the plasma, the number density...
Criteria for maximizing the single-line emission of the pinch plasma in plasma focus devices (1994)
Lebert, R., Bergmann, K., Rothweiler, D., Neff, W.
The number of photons emitted into one emission line (i.e. NVII 1s-2p at 2.48 nm) per unit area and per unit solid angle per pulse (TISB) is the relevant figure of merit for pulsed x-ray sources used...
FOSTER, E. M., KAY, D. W. K., BERGMANN, K.
A sample of 477 people aged 65 years and over, randomly selected from electoral rolls, were visited in their homes, independently, by a medical social worker and a psychiatrist. Twelve per cent were...
PSYCHOGERIATRIC ASCERTAINMENT AND ASSESSMENT FOR TREATMENT IN AN ACUTE MEDICAL WARD SETTING (1974)
One hundred elderly patients admitted to an acute medical unit in a general hospital were screened for psychiatric morbidity. Of the sample 7 per cent were demented, 16 per cent suffered from acute...
Effect of family relationships on psychogeriatric patients.
Bergmann, K, Manchee, V, Woods, R T
Severe strain has been repeatedly reported in the families of psychogeriatric patients. Nevertheless, many families continue to provide a great deal of support, despite the undoubted burden involved....
Perry, E K, Tomlinson, B E, Blessed, G, Bergmann, K, Gibson, P H, Perry, R H
Necropsy brain tissue from normal (control) patients and patients with depression and dementia was examined for activities of various cholinergic components, and these related to the degree of senile...
Effect of family relationships on psychogeriatric patients.
Bergmann, K, Manchee, V, Woods, R T
Severe strain has been repeatedly reported in the families of psychogeriatric patients. Nevertheless, many families continue to provide a great deal of support, despite the undoubted burden involved....
Perry, E K, Tomlinson, B E, Blessed, G, Bergmann, K, Gibson, P H, Perry, R H
Necropsy brain tissue from normal (control) patients and patients with depression and dementia was examined for activities of various cholinergic components, and these related to the degree of senile...
Müller, M K, Degenhardt, H, Klöppel, G, Goebell, H, Bergmann, K, Löhr, M
Cyclosporin 5, 10, and 20 mg/kg bw was given to rats once daily intragastrically and caused a dose dependent, significant decrease of glucose dependent insulin release from the arterially perfused...
Haemodynamic changes during paroxysmal tachycardia in a patient with Wolff-Parkinson-White syndrome.