Advances in SLM development for microlithography (2009)
Dauderstädt, U., Askebjer, P., Björnängen, P., Dürr, P., Friedrichs, M., List, M., ...
The Fraunhofer IPMS, in cooperation with Micronic Laser Systems, develops and fabricates micromirror arrays used as spatial light modulators (SLM) for image generation in microlithography. The SLMs...
Während sich produzierende Unternehmen bei der Gestaltung ihrer IT-Landschaft meist auf die Auswahl einzelner IT-Systeme, beispielsweise eines ERP-Systems, beschränken, wird das Zusammenspiel...
Charging effects in micromirror spatial light modulators (2008)
Dauderstädt, U., Dürr, P., Sinning, S., Wullinger, I., Wagner, M.
We describe charging effects on spatial light modulators (SLM). These light modulators consist of up to one million mirrors that can be addressed individually and are operated at a frame rate of up...
Charging effects in spatial light modulators based on micromirrors (2007)
Dauderstädt, U., Bakke, T., Dürr, P., Sinning, S., Wullinger, I., Wagner, M., ...
This paper describes charging effects on spatial light modulators (SLM). These light modulators consist of up to one million mirrors that can be addressed individually and are operated at a frame...
Methode zur Verbesserung der Planarität von Flächenlichtmodulatoren (2007)
Mikromechanische Flächenlichtmodulatoren (spatial light modulator, SLM) werden bereits in vielen Bereichen eingesetzt. Beispielsweise in der Mikrolithografie bestehen dabei besonders hohe...
Hochauflösende Flächenlichtmodulatoren auf Basis von Mikrospiegelmatrizen (2007)
Wagner, M., Dürr, P., Dauderstädt, U., Gehner, A., Friedrichs, M., ...
Am Fraunhofer Institut für Photonische Mikrosysteme (IPMS), Dresden werden anwendungsspezifische Flächenlichtmodulatoren (Spatial Light Modulators, SLM) auf Basis von hochintegrierten...
Micro-actuator with extended analog deflection at low drive voltage (2006)
Dürr, P., Gehner, A., Schmidt, J., Kunze, D., Wagner, M., Lakner, H.
Mechanical stability of spatial light modulators in microlithography (2005)
Dauderstädt, U., Dürr, P., Ljungblad, U., Karlin, T., Schenk, H., Lakner, H.
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a...
Light processing with electrostatically driven micro scanning mirrors and micro mirror arrays (2004)
Schenk, H., Dauderstädt, U., Dürr, P., Gehner, A., Wolter, A., Lakner, H.
Application of spatial light modulators for microlithography (2004)
Dauderstädt, U., Dürr, P., Karlin, T., Schenk, H., Lakner, H.
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors...
Operation of spatial light modulators in DUV light (2003)
Dauderstädt, U., Dürr, P., Krellmann, M., Karlin, T., Berzinsh, U., Leonardsson, L., ...
The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by...
Characterization of spatial light modulators for microlithography (2003)
Dürr, P., Dauderstädt, U., Kunze, D., Auvert, M., Bakke, T., Schenk, H., ...
The Fraunhofer IMS in Dresden is developing and fabricating spatial light modulators (SLMs) for micro lithography with DUV radiation. The accuracy of analog modulation is very important for the...
Mustererzeugung und -erfassung mit mikromechanischen Spiegeln und Spiegelarrays (2002)
Lakner, H., Dürr, P., Schenk, H., Gehner, A.
Mit der Entwicklung und Markteinführung neuartiger Mikrosysteme, die optische, mechanische und elektronische Funktionalität miteinander verknüpfen, können neuartige Produkte für die...
Reliability test and failure analysis of optical MEMS (2002)
Dürr, P., Dauderstädt, U., Kunze, D., Auvert, M., Lakner, H.
Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) with optical MEMS devices offers such possibilities. Special emphasis must be put on the...
A Spatial Light Modulator (SLM) for advanced lithography (2001)
Dauderstädt, U., Dürr, P., Doleschal, W.
Using a newly developed SLM it is possible to build a photomask writer tool that fulfills all specifications for the 0.13 node. It is furthermore possible to extend the new architecture to several...
New architecture for laser pattern generators for 130 nanometers and beyond (2001)
Ljungblad, U., Sandström, T., Buhre, H., Dürr, P., Lakner, H.
A new breed of pattern generators for photomasks using a new DUV spatial light modulator (SLM) technology is under development in a collaborative effort between Micronic Laser Systems AB, Taby,...
Design and fabrication of micromirror arrays for UV-lithography (2001)
Lakner, H., Dürr, P., Dauderstädt, U., Doleschal, W., Amelung, J.
Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to...
A resonantly excited 2D-micro-scanning-mirror with large deflection (2001)
Schenk, H., Dürr, P., Kunze, D., Lakner, H., Kück, H.
We present a novel resonantly excited 2D-micro-scanning-mirror which makes use of an electrostatic driving principle. To achieve large deflection angles, the driving electrodes are located in the...
New laser pattern generator for DUV using a spatial light modulator (2001)
Ljungblad, U., Dauderstädt, U., Dürr, P., Sandström, T., Buhre, H., Lakner, H.
A new breed of pattern generators for photomasks using spatial light modulator (SLM) technology with many architectural similarities to that of a modern stepper is under development. The SLM, having...
Large deflection micromechanical scanning mirrors for linear scans and pattern generation (2000)
Schenk, H., Dürr, P., Haase, T., Kunze, D., Sobe, U., Lakner, H., ...
An electrostatically driven silicon micro scanning mirror (MSM) for one-dimensional (1-D) and two-dimensional (2-D) deflection of light is presented. A special configuration of the driving electrodes...
Test system for micro mirror arrays (2000)
Dürr, P., Tanneberger, T., Wolter, A., Kluge, W., Doleschal, W., Lakner, H.
Over the last few years, high resolution spatial light modulators (SLMs) have been developed at the IMS Dresden. These are fabricated using one of two different technological processes. In one...
Design and modelling of large deflection micromechanical 1D and 2D scanning mirrors (2000)
Schenk, H., Dürr, P., Kunze, D., Lakner, H., Kück, H.
Design and modelling aspects of torsional 1D and 2D Micro Scanning Mirrors are presented. During the oscillation of the mirror plate the inertial moment gives rise to a deformation of the plate. This...
Schenk, H., Dürr, P., Kunze, D., Lakner, H., Kück, H.
A novel resonantly excited 2D-Micro-Scanning-Mirror is presented which makes use of an electrostatic driving principle allowing to locate the driving electrodes in the chip plane. The mechanical...
A novel electrostatically driven torsional actuator (1999)
Schenk, H., Dürr, P., Kück, H.
A novel CMOS-compatible manufactured electrostatically driven torsional actuator for periodic deflection of light is presented. The mechanical elements consist of a single crystal silicon film. The...
A new driving principle for micromechanical torsional actuators (1999)
Schenk, H., Dürr, P., Kunze, D., Kück, H.
An electrostatic driving principle for micromechanical torsional actuators is presented which allows to excite mechanical oscillations with large deflection angles at low driving voltages. This is...
Micromirrors for direct writing systems and scanners (1999)
Lakner, H., Doleschal, W., Dürr, P., Gehner, A., Schenk, H., Wolter, A., ...
Three different types of deformable mirror Spatial Light Modulators (SLMs) based on device concepts like Viscoelastic Control Layer (VCL), Cantilever Beam Mirror (CBM), and Moving Liquid Mirror (MLM)...
Micromirror spatial light modulators (1999)
Dürr, P., Gehner, A., Dauderstädt, U.A.
The devices consist of an array of independently addressable CMOS DRAM cells each controlling a micromachined mirror pixel. The micromirrors are fabricated in a sacrificial layer technique forming...
Antrieb für mikromechanische Scannerspiegel (1999)
Schenk, H., Dürr, P., Sobe, U.
Eine neuartige Elektrodenkonfiguration für den Antrieb mikromechanischer Scannerspiegel ermöglicht große Ablenkwinkel. Auch eine zweidimensionale Ablenkung ist mit dem Prinzip möglich, wie erste...
Beschleunigungssensoren: Vorteile durch SIMOX-Technologie (1998)
Sölla, F., Köhler, R., Dürr, P., Sobe, U.
Durch den Einsatz von Beschleunigungssensoren ist das Fahren im Automobil für die Insassen um einiges sicherer und komfortabler geworden. In diesem Artikel wird eine Sensortechnologie vorgestellt,...