R. Springer

TOMMI - a new instrument for the characterisation of materials at high temperatures (2003)

Sebastian, K., Raether, F., Springer, R.

Large-field particle beam optics for projection and proximity printing and for maskless lithography (2003)

Löschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., ...

Resistless patterning of magnetic storage media using ion projection structuring (2002)

Dietzel, A., Berger, R., Grimm, H., Schug, C., Brünger, W.H., Dzionk, C., ...

Large-field ion-optics for projection and proximity printing and for mask-less lithography (ML2) (2002)

Löschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., ...

Ion projection direct structuring for patterning of magnetic media (2002)

Dietzel, A., Berger, R., Grimm, H., Brünger, W.H., Dzionk, C., Letzkus, F., ...

Ion projection facilitates a direct structuring, which Is an attractive potential manufacturing process for patterned storage media. An advantage to this method is that the media roughness remaines...

Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films (2002)

Brünger, W.H., Dzionk, C., Berger, R., Grimm, H., Dietzel, A., Letzkus, F., ...

Optical dilatometry for the control of microstructure development during sintering (2001)

Raether, F., Springer, R., Beyer, S.

An optical method for the in situ measurement of sintering shrinkage has been developed. It relies on a simple and robust CCD camera technique and is applicable up to high temperatures (2000...

Untersuchung von Aluminiumoxid im letzten Sinterstadium mittels Lichtstreuung und optischer Dilatometrie (2001)

Springer, R.

Status of ion projection lithography (2001)

Brünger, W., Kaesmaier, R., Loeschner, H., Springer, R.

Reference plate manufacturing process for the ion projection lithography pattern lock system (2001)

Letzkus, F., Butschke, J., Irmscher, M., Reuter, C., Springer, R., Eder, S., ...

The 4 × Ion Projection Lithography (IPL), which is designed to reach sub 70-nm feature sizes is a promising technology for the Next Generation Lithography (NGL). An important feature of IPL is the...

Die optische Lithographie – eine Schlüsseltechnologie der Mikrostrukturierung (2000)

Brauch, U., Hoffmann, T., Springer, R.

In situ measurement of light scattering in porous ceramics during sintering (2000)

Springer, R., Raether, F., Caps, R., Manara, J.

In-situ measurement of neck formation during sintering of alumina by a novel thermo-optical measuring device (2000)

Raether, F., Springer, R.

Monomodefasergekoppelte Halbleiterlasersysteme für den Direkteinsatz (1999)

Bartelt-Berger, L., Becker, U., Brauch, U., Colletto, C., Giesen, A., Hergenhan, G., ...

Highly-Parallel Laser Lithography (1999)

Brauch, U., Colletto, C., Höfflinger, B., Hoffmann, T., Menschig, A., Opower, H., ...

Improved sintering of alumina by new in situ measuring methods (1999)

Raether, F., Zimmer, J., Springer, R.