UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scale (2009)
Schmitt, H.,
Amon, B.,
Beuer, S.,
Petersen, S.,
Rommel, M.,
Bauer, A.J.,
...
Imprint specific process parameters like the residual layer thickness and the etch resistance of the UV polymers for the substrate etch process have to be optimized to introduce UV nanoimprint...
Experimental observation of FIB induced lateral damage on silicon samples (2009)
Spoldi, G.,
Beuer, S.,
Rommel, M.,
Yanev, V.,
Bauer, A.J.,
Ryssel, H.
Scanning spreading resistance microscopy (SSRM) and scanning capacitance microscopy (SCM) were used to analyze focused ion beam (FIB) induced lateral damage around milled structures on silicon. For...
SSRM characterisation of FIB induced damage in silicon (2008)
Beuer, S.,
Yanev, V.,
Rommel, M.,
Bauer, A.J.,
Ryssel, H.
Scanning spreading resistance microscopy (SSRM) has been applied to study focused ion beam (FIB) induced damage in silicon in dependence on ion irradiation doses from 10(exp 12) cm-2 to 2·10(exp 16)...
Recent improvements in the integration of field emitters into scanning probe microscopy sensors (2008)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Recent improvements in the fabrication of integrated field emitters with a control electrode into scanning probe microscopy sensors are presented and discussed. Compared to earlier work the precursor...
Electrical AFM techniques for the advanced characterization of materials in semiconductor technology: Poster at NanoScale VI, Berlin, Germany, July 9-11, 2008 (2008)
Yanev, V.,
Rommel, M.,
Spoldi, G.,
Beuer, S.,
Amon, B.,
Petersen, S.,
...
Experimental observation of FIB induced lateral damage on silicon samples: Poster at 34th International Conference on Micro&Nano Engineering, MNE 2008, Athens (2008)
Spoldi, G.,
Beuer, S.,
Rommel, M.,
Yanev, V.,
Bauer, A.J.,
Ryssel, H.
Experimental observation of FIB induced lateral damage on silicon samples: Poster at 34th International Conference on Micro&Nano Engineering, MNE 2008, Athens (2008)
Spoldi, G.,
Beuer, S.,
Rommel, M.,
Yanev, V.,
Bauer, A.J.,
Ryssel, H.
Electrical AFM techniques for the advanced characterization of materials in semiconductor technology: Poster at NanoScale VI, Berlin, Germany, July 9-11, 2008 (2008)
Yanev, V.,
Rommel, M.,
Spoldi, G.,
Beuer, S.,
Amon, B.,
Petersen, S.,
...
Accurate parameter extraction for the simulation of direct structuring by ion beams (2007)
Beuer, S.,
Rommel, M.,
Lehrer, C.,
Platzgummer, E.,
Kvasnica, S.,
Bauer, A.J.,
...
In this work, methods for an accurate extraction of parameters for the simulation of nanoscaled structuring by focused ion beams will be discussed. For this purpose the quantitative understanding of...
Recent improvements in the integration of field emitters into scanning probe microscopy sensors: Poster at MNE 2007, 33rd International Conference on Micro- and Nano-Engineering 2007, Copenhagen, Denmark (2007)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy: Poster at ICN+T 2007, International Conference on Nano Science and Technology 2007, Stockholm, Sweden (2007)
Beuer, S.,
Yanev, V.,
Rommel, M.,
Bauer, A.J.,
Ryssel, H.
Recent improvements in the integration of field emitters into scanning probe microscopy sensors: Poster at MNE 2007, 33rd International Conference on Micro- and Nano-Engineering 2007, Copenhagen, Denmark (2007)
Beuer, S.,
Rommel, M.,
Petersen, S.,
Amon, B.,
Sulzbach, T.,
Engl, W.,
...
Electrical characterization of low dose focused ion beam induced damage in silicon by scanning spreading resistance microscopy: Poster at ICN+T 2007, International Conference on Nano Science and Technology 2007, Stockholm, Sweden (2007)
Beuer, S.,
Yanev, V.,
Rommel, M.,
Bauer, A.J.,
Ryssel, H.
Verfahren zur Erzeugung von Submikrometer-Strukturen an einer ausgepraegten Topographie (2007)
Lehrer, C.,
Beuer, S.,
Engl, W.,
Richter, C.,
Sulzbach, T.
DE 102007056992 A1 UPAB: 20090609 NOVELTY - The method involves forming a layer sequence on a topography i.e. substrate (1) with an elevation (1a), for covering the substrate, where the sequence has...
Accurate parameter extraction for the simulation of direct structuring by ion beams: Poster at MNE 2006, 32nd International Conference on Micro- and Nano- Engineering 2006, Barcelona, Spain (2006)
Beuer, S.,
Rommel, M.,
Lehrer, C.,
Platzgummer, E.,
Kvasnica, S.,
Bauer, A.J.,
...
Accurate parameter extraction for the simulation of direct structuring by ion beams: Poster at MNE 2006, 32nd International Conference on Micro- and Nano- Engineering 2006, Barcelona, Spain (2006)
Beuer, S.,
Rommel, M.,
Lehrer, C.,
Platzgummer, E.,
Kvasnica, S.,
Bauer, A.J.,
...