T. Böttger

Details der Publikationsliste

Zeitraum

1993 - 2008

Anzahl

16

Co-Autoren

Laboratory LPP EUV reflectometer working with non-polarized radiation (2005)

Loyen, L. Van, Böttger, T., Schädlich, S., Braun, S., Foltyn, T., Leson, A., ...

A laboratory extreme ultraviolet reflectometer (EUVR) for the wavelength range from 10 to 16 nm was built at IWS Dresden using a gold target laser pulse plasma (Au-LPP) source. The peak reflectance...

High reflection optics and high precision metrology for extreme ultraviolet (EUV) light (2004)

Braun, S., Böttger, T., Foltyn, T., Loyen, L. Van, Leson, A.

The ever-decreasing pattern size of structures in integrated circuits requires lithography processes using light of ever-shorter wavelengths. Currently, laser light with wavelengths of 248 nm and 193...

Stress compensation of a Mo/Si/C highly reflective multilayer by means of an optimised buffer layer and heat treatment (2004)

Moss, M., Böttger, T., Braun, S., Foltyn, T., Leson, A.

The dependency of the stress present in Mo/Si/C multilayers on the constituent individual layers has been investigated. The heat treatment of a multilayer stack, consisting of a highly reflective...

Thermal stability of Mo/Si multilayers with boron carbide interlayers (2003)

Böttger, T., Meyer, D.C., Paufler, P., Braun, S., Moss, M., Mai, H., ...

Mo/Si multilayer systems with boron carbide (B4C) diffusion barrier layers were deposited on sapphire and silicon substrates by DC magnetron sputtering. Samples were subsequently annealed in vacuum...

New laboratory EUV reflectometer for large optics using a laser plasma source (2003)

Loyen, L. Van, Böttger, T., Braun, S., Mai, H., Leson, A., Scholze, F., ...

The quality assurance for the production of optical components for Extreme Ultra Violet Lithography (EUVL) strongly requires at-wavelength metrology. Presently, at-wavelength characterizations of...

Custom-tailored nm-multilayers for EUV and X-ray optical applications (2003)

Braun, S., Böttger, T., Foltyn, T., Moss, M., Loyen, L. Van, Leson, A.

We describe a new approach for the deposition of multilayers with arbitrary period thickness distributions. The standard technique of magnetron sputter deposition has been extended to a design where...

Carbon / Carbon multilayer - A new approach in the development of nanometer-multilayer x-ray optics (2003)

Dietsch, R., Böttger, T., Braun, S., Holz, T., Weißbach, D.

The use of nanometer-multilayer X-ray optics induced a decisive extension of opportunities both in laboratory based X-ray analysis in the field of synchrotron radiation. With the growing number of...

Optimization of piecewise linear networks (PLN) by pruning. (2001)

Eppler, W., Böttger, T.

Joint 9th IFSA World Congress and 20th NAFIPS Internat.Conf.(NAFIPS = North American Fuzzy Information Processing Soc. / IFSA = Internat.Fuzzy Systems.Association), Vancouver, CDN, July 25-28, 2001