PLD of hard ceramic coatings (2001)
Perera, Y., Gottmann, J., Husmann, A., Klotzbücher, T., Kreutz, E.W., Poprawe, R.
The deposition of different hard ceramics coatings as Al2O3, ZrO2, c-BN and DLC thin films by pulsed laser deposition (PLD) has been of increasing interest as alternative process compared to the...
Perera, Y., Schlaghecken, G., Gottmann, J., Klotzbücher, T., Kreutz, E.W., Poprawe, R.
Pulsed laser deposition with KrF-excimer laser radiation (lambda = 248 nm; t = 25 ns) is used to grow diamond like carbon (DLC) thin films on PMMA and tool steel substrates. The investigations are...
Functional and structural properties of thin electroceramic films by laser radiation (1999)
Kreutz, E.W., Gottmann, J., Mergens, M., Klotzbücher, T., Vosseler, B.
The deposition of single layer electroceramic thin films by pulsed excimer laser radiation (248 nm) on Ti/Pt/Si (111) substrates is investigated as a function af laser parameters (fluence, repetition...
Klotzbücher, T., Mergens, M., Husmann, A., Gottmann, J., Kreutz, E.W.
Raman spectroscopy is employed for structural characterization of BaTiO3 ferroelectric thin films, deposited by a hybrid DC-field enhanced pulsed laser deposition (PLD)-process. Pulsed excimer laser...
Pulsed laser deposition of ceramic thin films using different laser sources (1998)
Husmann, A., Gottmann, J., Klotzbücher, T., Kreutz, E.W.
Sintered targets of Al2O3 are removed by CO(2-) and excimer laser radiation and deposited as thin films onto steel and silicon substrates. Micro Raman spectroscopy and atomic force microscopy are...
Optical properties of alumina and zirconia thin films grown by pulsed laser deposition (1998)
Gottmann, J., Husmann, A., Klotzbücher, T., Kreutz, E.W.
Sintered targets of ZrO2 and Al2O3 are ablated by KrF excimer laser radiation. The processing gas atmosphere consists of O2 at typical pressures of 10(exp -3)-1 mbar. Films with a thickness of...
Neue Entwicklungen im Bereich der Dünnschichttechnologie (1998)
Kreutz, E.W., Gottmann, J., Klotzbücher, T.
Wie die Werkstoffe als Struktur- und Funktionswerkstoffe hergestellt werden können, lassen sich auch Schichten auf Substraten als Struktur- und Funktionsschichten abscheiden. Die Strukturschichten...
Gottmann, J., Klotzbücher, T., Kreutz, E.W.
Sintered targets of ZrO2, Al2O3 and BaTiO3 are ablated by KrF excimer laser radiation lambda=248 mn,tau=25 ns. The processing gas atmosphere consists Of O2 at typical pressures of 10(exp -3)-0.5...
Klotzbücher, T., Gottmann, J., Meyer, M., Wesner, D.A., Kreutz, E.W.
Pulsed laser deposition (PLD) with KrF-excimer laser radiation (lambda = 248 nm, tau = 25 ns) is used to grow thin films Of diamond-like carbon (DLC) on Si substrates by material removal from a...
Deposition of carbon nitride thin films in a hybrid r.f.-PLD technique (1998)
Klotzbücher, T., Scherge, M., Mergens, M., Wesner, D.A., Kreutz, E.W.
In a hybrid r.f.-PLD technique pulsed laser deposition (PLD) in combination with a capacitively coupled r.f. substrate bias with nitrogen as processing gas was used to synthesize CN(x) films with...
Crystal quality and orientation of pulsed laser deposited barium titanate thin films (1998)
Gottmann, J., Klotzbücher, T., Vosseler, B., Kreutz, E.W.
KrF excimer laser radiation (lambda=248 nm, tau=25 ns) is used for pulsed laser deposition of BaTiO3 thin films on Pt/Ti/Si multilayer substrates. The processing gas atmosphere consists of O2 at...
Pulsed laser deposition of crystalline PZT thin films (1997)
Husmann, A., Wesner, D.A., Schmidt, J., Klotzbücher, T., Mergens, M., Kreutz, E.W.
Sintered targets of PbZ(0.52)Ti(0.48)O3, are used in a pulsed laser deposition (PLD) process to deposit thin ferroelectric films onto a Pt/Ti/Si(111) substrate for electrical applications. Repetition...
Deposition of BaTiO3 thin films by a hybrid DC-field enhanced PLD-process (1997)
Husmann, A., Mertin, M., Klotzbücher, T., Kreutz, E.W.
BaTiO3, thin films are deposited onto (111)-Si/Ti/Pt using a hybrid DC-field enhanced pulsed laser deposition (PLD)-technique with excimer laser radiation. Space- and time-resolved plasma emission...
Surface analysis of films and film systems produced by pulsed laser deposition (1995)
Wesner, D.A., Pfleging, W., Klotzbücher, T., Kreutz, E.W.
Ceramic films and film systems (ZrO2 films, ZrO2/Ti multilayers, and BN films) are deposited by pulsed laser deposition (PLD) and analyzed using X-ray photoelectron (XPS), Auger electron (AES), and...
Structure and chemical composition of BN thin films grown by pulsed-laser deposition -PLD- (1995)
Klotzbücher, T., Pfleging, W., Mertin, M., Wesner, D.A., Kreutz, E.W.
BN thin films are grown on Si(100) substrates in a pulsed-laser-deposition (PLD) process using a pulsed CO2 laser, a hexagonal-phase BN (h-BN) target, and N2 as processing gas. The effect of RF power...
Laser radiation. A tool for generation of defined thin film properties for application (1995)
Kreutz, E.W., Alunovic, M., Klotzbücher, T., Mertin, M., Wesner, D.A., Pfleging, W.
Pulsed laser deposition as a method of physical vapour deposition suitable for the deposition of thin films with complex structures and compositions is briefly reviewed. Excimer, Nd:YAG and CO2 laser...