Advances in SLM development for microlithography (2009)
Dauderstädt, U., Askebjer, P., Björnängen, P., Dürr, P., Friedrichs, M., List, M., ...
The Fraunhofer IPMS, in cooperation with Micronic Laser Systems, develops and fabricates micromirror arrays used as spatial light modulators (SLM) for image generation in microlithography. The SLMs...
Charging effects in micromirror spatial light modulators (2008)
Dauderstädt, U., Dürr, P., Sinning, S., Wullinger, I., Wagner, M.
We describe charging effects on spatial light modulators (SLM). These light modulators consist of up to one million mirrors that can be addressed individually and are operated at a frame rate of up...
Planarity optimization of spatial light modulators (2008)
Duerr, P., Wolschke, S., Ludewig, T., Dauderstädt, U., Kunze, D., Wagner, M., ...
Charging effects in spatial light modulators based on micromirrors (2007)
Dauderstädt, U., Bakke, T., Dürr, P., Sinning, S., Wullinger, I., Wagner, M., ...
This paper describes charging effects on spatial light modulators (SLM). These light modulators consist of up to one million mirrors that can be addressed individually and are operated at a frame...
Hochauflösende Flächenlichtmodulatoren auf Basis von Mikrospiegelmatrizen (2007)
Wagner, M., Dürr, P., Dauderstädt, U., Gehner, A., Friedrichs, M., ...
Am Fraunhofer Institut für Photonische Mikrosysteme (IPMS), Dresden werden anwendungsspezifische Flächenlichtmodulatoren (Spatial Light Modulators, SLM) auf Basis von hochintegrierten...
Mechanical stability of spatial light modulators in microlithography (2005)
Dauderstädt, U., Dürr, P., Ljungblad, U., Karlin, T., Schenk, H., Lakner, H.
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors as a...
Micro-opto-electro-mechanical systems technology and its impact on photonic applications (2005)
Schenk, H., Wolter, A., Dauderstädt, U., Gehner, A., Lakner, H.
Light and electricity are two major sources leading technology advances into the future. Micro-opto-electro-mechanical-systems (MOEMS) devices combine these two sources in an ideal manner: they are...
Light processing with electrostatically driven micro scanning mirrors and micro mirror arrays (2004)
Schenk, H., Dauderstädt, U., Dürr, P., Gehner, A., Wolter, A., Lakner, H.
Photonic microsystems: An enabling technology for light deflection and modulation (2004)
Schenk, H., Wolter, A., Dauderstädt, U., Gehner, A., Grüger, H., Drabe, C., ...
Light and electricity are said to be the all purpose tools for the next decades. Photonic Microsystems combine this tools in an ideal manner: They are electronically addressable devices with an...
Application of spatial light modulators for microlithography (2004)
Dauderstädt, U., Dürr, P., Karlin, T., Schenk, H., Lakner, H.
The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM). This technology uses an array of micromirrors...
Operation of spatial light modulators in DUV light (2003)
Dauderstädt, U., Dürr, P., Krellmann, M., Karlin, T., Berzinsh, U., Leonardsson, L., ...
The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by...
Characterization of spatial light modulators for microlithography (2003)
Dürr, P., Dauderstädt, U., Kunze, D., Auvert, M., Bakke, T., Schenk, H., ...
The Fraunhofer IMS in Dresden is developing and fabricating spatial light modulators (SLMs) for micro lithography with DUV radiation. The accuracy of analog modulation is very important for the...
Reliability test and failure analysis of optical MEMS (2002)
Dürr, P., Dauderstädt, U., Kunze, D., Auvert, M., Lakner, H.
Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) with optical MEMS devices offers such possibilities. Special emphasis must be put on the...
A Spatial Light Modulator (SLM) for advanced lithography (2001)
Dauderstädt, U., Dürr, P., Doleschal, W.
Using a newly developed SLM it is possible to build a photomask writer tool that fulfills all specifications for the 0.13 node. It is furthermore possible to extend the new architecture to several...
Design and fabrication of micromirror arrays for UV-lithography (2001)
Lakner, H., Dürr, P., Dauderstädt, U., Doleschal, W., Amelung, J.
Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to...
New laser pattern generator for DUV using a spatial light modulator (2001)
Ljungblad, U., Dauderstädt, U., Dürr, P., Sandström, T., Buhre, H., Lakner, H.
A new breed of pattern generators for photomasks using spatial light modulator (SLM) technology with many architectural similarities to that of a modern stepper is under development. The SLM, having...