U. Schnakenberg

Details der Publikationsliste

Zeitraum

1987 - 2008

Anzahl

66

Co-Autoren

CHF-Monitoring - Bewertung von zwei alternativen Implantatkonzepten (2008)

Urban, U., Fassbender, H., Görtz, M., Steinseifer, U., Schmitz-Rode, T., ...

Das Therapiemanagement von Patienten mit Herzschwäche ist sehr komplex und sollte möglichst früh angesetzt werden, auch wenn noch keine Beschwerden verursacht werden. Minimal invasiv...

Vascular capsule for telemetric monitoring of blood pressure (2003)

Schmitz-Rode, T., Schnakenberg, U., Pfeffer, J.G., Piroth, W., Bögel, G. Vom, Mokwa, W., ...

PURPOSE: Development and experimental evaluation of an intravascular monitoring system for telemetric measurement of blood pressure and heart rate. MATERIALS AND METHODS: The monitoring system...

Intravascular pressure monitoring system (2002)

Krüger, C., Pfeffer, J.G., Mokwa, W., Bögel, G. Vom, Günther, R., Schmitz-Rhode, T., ...

Monitoring of blood pressure and pulse rate offers diagnostical and therapeutical opportunities in hypertension disease and arrhythmia, respectively. This paper presents an intravascular pressure...

Intravascular pressure monitoring system (2002)

Schnakenberg, U., Krüger, C., Mokwa, W., Bögel, G. Vom, Günther, R., ...

Monitoring of blood pressure offers diagnostical and therapeutical possibilities in hypertension decease. The determination of pulse rate is comfortable for detection of arrhythmia or blood sugar for...

Transponder system for non-invasive measurement of intravascular pressure (2002)

Schnakenberg, U., Krüger, C., Pfeffer, J.G., Mokwa, W., Bögel, G. Vom, Günther, R., ...

Monitoring of blood pressure and pulse rate offers diagnostical and therapeutical opportunities in hypertension disease and arrhythmia, respectively. This paper presents an intravascular pressure...

A foldable artificial lens with an integrated transponder system for measuring intraocular pressure (2001)

Ullerich, S., Mokwa, W., Bögel, G. Vom, Schnakenberg, U.

A miniaturised and foldable transponder system consisting of a chip and a micro coil for measuring intraocular pressure continously is presented. Investigations for design optimisation of the micro...

Micro-transponder systems for medical applications (2001)

Mokwa, W., Schnakenberg, U.

The low power consumption of CMOS electronics with on-chip cointegrated sensors or actuators make it ideal for use in implanted systems that need a very low power consumption. Three examples are...

Micro coils for an advanced system for measuring intraocular pressure (2000)

Ullerich, S., Mokwa, W., VomBögel, G., Schnakenberg, U.

A miniaturised transponder system consisting of a chip and a micro coil for measuring intraocular pressure continuously is presented. The system will be integrated in the haptic of a soft artificial...

Development of a completely encapsulated intraocular pressure sensor (2000)

Walter, P., Schnakenberg, U., VomBögel, G., Ruokonen, P., Krüger, C., Dinslage, S., ...

A completely encapsulated intraocular pressure (IOP) sensor equipped with telemetric signal and energy transfer is introduced integrated into a silicone disc for implantation into the eye. After...

Initial investigations on systems for measuring intraocular pressure (2000)

Schnakenberg, U., Walter, P., Bögel, G. Vom, Krüger, C., Lüdtke-Handjery, H.C., Richter, H.A., ...

Basic investigations on an intraocular implant system for continuous measurements of the intraocular pressure (IOP) are introduced. The system consists of a pressure sensor connected to transponder...

Implantable microdevices (1999)

Mokwa, W., Schnakenberg, U.

This paper concentrates on recent developments in the field of implantable sensor and actuator systems. As examples for sensing systems the measurement of the intraocular pressure by an implanted...

Basic investigations on a system for measuring intraocular pressure (1999)

Schnakenberg, U., Walter, P., VomBögel, G., Krüger, C., Lüdtke Handjery, H.C., Richter, H. A., ...

Investigations on an intraocular implant system for continuous measurements of intraocular pressure are introduced. In a first version the system consists of a miniaturised pressure sensor, which is...

On-chip microsystems for medical applications (1998)

Mokwa, W., Schnakenberg, U.

Due to the process in semiconductor technology in the last years, silicon devices are available having a very high functionality and complexity. CMOS has become the standard technology for highest...

Elektrochemischer Sensor (1997)

Hintsche, R., Paeschke, M., Schnakenberg, U., Wollenberger, U.

The invention relates to an electrochemical sensor comprising interdigital microelectrodes (1) which have line widths in the subm range. By means of array-shaped arrangement of two or several pairs...

Novel potentiometric silicon sensor for medical devices (1996)

Schnakenberg, U., Lisec, T., Hintsche, R., Kuna, I., Uhlig, A., Wagner, B.

The fabrication process for a potentiometric silicon sensor is described. The sensor was fabricated in bulk silicon micromachining using double side wafer processing. A small channel was etched...

Verfahren zur Beschichtung von Sensoren mit selektiv durchlaessigen Polymermembranen (1995)

Hintsche, R., Benecke, W., Schnakenberg, U.

The description refers to a process for the coating of sensors with selectively permeable polymer diaphragms. The invention is characterized by the fact that a permanent adhesive coating made of at...

Novel potentiometric silicon sensor for medical devices (1995)

Schnakenberg, U., Lisec, T., Hintsche, R., Kuna, I., Uhlig, A., Wagner, B.

The fabrication process for a potentiometric silicon sensor will be described. The sensor was fabricated in bulk silicon micromachining using a double side wafer process. A small channel was etched...

Catheter system for potassium measurements in medical application (1995)

Uhlig, A., Schnakenberg, U., Lindner, E., Dittrich, F., Hintsche, R.

In critical care the blood potassium concentration is an important parameter to characterise the patients condition. To switch from the common ex situ determination of potassium (mostly in serum) to...

VORRICHTUNG ZUR MESSUNG MECHANISCHER KRAEFTE UND KRAFTWIRKUNGEN (1994)

Wagner, B., Benecke, W., Riethmueller, W., Schnakenberg, U.

Beschrieben wird eine Vorrichtung zur Messung mechanischer Kraefte und Kraftwirkungen, die mittels mikromechanischer Prozesse herstellbar ist. Unter dem Einfluss einer mechanischen Kraft wird eine...

Use of interdigitated microelectrode arrays as amperometric transducers and amplifier (1993)

Paeschke, M., Schnakenberg, U., Wollenberger, U., Hintsche, R.

An array of six interdigitated thin film platinum microelectrodes made by silicon technology and special analytical procedures will be described. For the analytical use as basic transducer the...

Thin film microelectrode arrays for highly sensitive biosensors (1993)

Hintsche, R., Paeschke, M., Wollenberger, U., Schnakenberg, U., Lisec, T., Benecke, W.

Thin film platinum microbanks forming four interdigitated arrays were fabricated in silicon technology. The finger electrodes of the microbands were spaced in the submicrometer range. On top of the...

Interdigitated array microelectrodes for the determination of enzymatic activities: Poster. (1993)

Wollenberger, U., Paeschke, M., Schnakenberg, U., Hintsche, R.

Microelectrode arrays are receiving particular attention. One very attractive feature is the possibility of electrochemical signal amplification by redox recyclisation of reversible electron...

Electrode arrays used as transducer and amplifier in biosensing microflow systems (1993)

Hintsche, R., Paeschke, M., Wollenberger, U., Schnakenberg, U., Lisec, T.

An array of six interdigital thin film Pt-electrodes made by silicon technology, where the 1,5 Mym fingers are 0,8 Mym spaced, have been arranged perpendicular to the axis of silicon etched channels....

A smart accelerometer with on-chip electronics fabricated by a commercial CMOS process (1992)

Schnakenberg, U., Wagner, B., Benecke, W., Riethmüller, W.

Piezoresistive accelerometers with a monolithically integrated operational amplifier werc produced, the fabrication process based on a commerial 3 Mym CMOS process. The mecahnical structures were...

Lithography with high depth of focus by an ion projection system (1992)

Schnakenberg, U., Torkler, M., Löschner, H., Stengl, G., Traher, C., ...

Ion projection lithography has been developed to generate structures with minimum feature sizes in the 100 nm range with a high pixel transfer rate. The high depth of focus resulting from the...

Dielectric induction micromotors - field levitation and torque-frequency characteristics (1992)

Fuhr, G., Hagedorn, R., Müller, T., Schnakenberg, U., Wagner, B., Benecke, W.

The characteristic motor operation of miniaturized dielectric induction motors is discussed with respect to microfabrication in semiconductor technology. The influence of a fluid filling the...

NH4OH-based etchants for silicon micromachining. Influence of additives and stability of passivation layers (1991)

Schnakenberg, U., Benecke, W., Löchel, B., Ullerich, S., Lange, P.

Solution based on ammonium hydroxide and water were investigated for anisotropic etching of monocrystalline silicon. In 2.65 M NH sub 3 solutions at 80 degree C, the addition of H sub 2 O sub 2 in a...

NH4OH-based etchants for silicon micromachining (1990)

Schnakenberg, U., Löchel, B., Benecke, W.

Wet chemical etchants based on ammonium hydroxide-water (AHW) solutions for micromachining monocrystalline silicon are described. The etchants can be applied under clean-room conditions within...

Disorder in vitreous SiO2 - The effect of thermal annealing on structural properties (1990)

Lange, P., Schnakenberg, U., Ullerich, S.

SiO2-passivation layers formed by thermal oxidation and various CVD-processes have been investigated by infrared spectroscopy and wet chemical etching studies in ammonium hydroxide water solutions....

Aetzfluessigkeit zum anisotropen Aetzen von Silizium und Verfahren zu deren Verwendung (1990)

Schnakenberg, U., Benecke, W.

A description is given of a process for anisotropic etching of semiconducting materials, the process being suitable for use in cleanrooms. The majority of known etching processes in microstructure...

Multi electron beam lithography - fabrication of a control unit (1989)

Schnakenberg, U., Wallendszus, V., Heuberger, A., Lischke, B., Benecke, W., Müller, K.P.

Electron beam lithography is limited by the extremely low throughput of currently working machines. This paper describes a multiple beam forming unit for a new line printer type lithography system...

Multi-beam concepts for nanometer devices (1989)

Lischke, B., Brunner, M., Herrmann, K.H., Heuberger, A., Knapek, E., Schnakenberg, U., ...

To overcome the throughput limitations in electron beam nanolithography, a multi beam system is proposed. Theoretical considerations show that this e-beam comb-probe printer with 1024 probes will be...

Anisotropes Aetzverfahren mit elektrochemischem Aetzstop (1989)

Benecke, W., Loechel, B., Schnakenberg, U.

The description refers to an anisotropic etching process for the etching of semiconducting materials by means of electrochemical etching stop. It is suitable for the production of micromechanical...

Optically excited mechanical vibrations in micromachined silicon cantilever structures (1987)

Heuberger, A., Schnakenberg, U., Wölfelschneider, H., Knoll, G., Ramakrishnan, S., Höfflin, H., ...

Mechanical vibrations in micromachined silicon cantilever structures with typical dimensions of 1000x80x5 micro cubicmeters by the local absorption of pulsed laser light at 780 nm or LED light at 830...

Micromechanical silicon actuators based on thermal expansion effects (1987)

Heuberger, A., Schnakenberg, U., Benecke, W., Riethmüller, W.

A new type of micromachined silicon actuator has been developed, based on the so-called bimetallic effect. The basic element of the actuator is a cantilever consisting of a silicon-metal sandwich...