V. J. Law

Details der Publikationsliste

Zeitraum

1992 - 2004

Anzahl

13

Co-Autoren

A frequency domain measurement diagnostic technique for plasma-tools (2004)

Law, V. J., Kenyon, A.J., Thornhill, N.F., Pagliarani, A., Lea, L., Watkins, M.

The design of a 10–500 MHz bridge is described and also its use with a tracking generator and spectrum analyser to form a scalar network analyser for the investigation of the internal...

Harmonic monitoring of the switched silicon etched process (2003)

Law, V.J., Kenyon, A.J., Thornhill, N.F., Pagliarani, A., Lee, K., Watkins, M., ...

A new non-invasive radio frequency technique for real-time monitoring of the STS ASE (TM) deep silicon etch process, or other forms of the Bosch switched etch process, is reported. The technique...

Harmonic monitoring of the switched silicon etched process (2003)

Law, V.J., Kenyon, A.J., Thornhill, N.F., Pagliarani, A., Lee, K., Watkins, M., ...

A new non-invasive radio frequency technique for real-time monitoring of the STS ASETM deep silicon etch process, or other forms of the Bosch switched etch process, is reported. The technique...

Remote-Coupled Oxygen Plasma Harmonic Measurements for Process Monitoring (2003)

Law, V.J., Bergamini, S., Kenyon, A.J., Thornhill, N.F., Lee, K., Watkins, M., ...

About the book: This book presents state-of-the-art analysis of developments in plasma physics.

RF probe technology for the next generation of technological plasmas (2001)

Law, V.J., Kenyon, A.J., Thornhill, N.F., Seeds, A.J., Batty, I.

We describe radio frequency (rf) analysis of technological plasmas at the 13.56 MHz fundamental drive frequency and integer narrow-band harmonics up to n = 9. In particular, we demonstrate the use of...

Remote-coupled sensing of plasma harmonics and process end-point detection (2000)

Law, V.J., Kenyon, A.J., Thornhill, N.F., Srigengan, V., Batty, I.

A remote-coupled dual-directional coupler used in the single-directional mode for process harmonic end-point detection is described. Harmonic end-point detection of photoresist stripping and chamber...

Principal component analysis of plasma harmonics in end-point detection of photoresist stripping (1999)

Koh, A.T-C., Thornhill, N.F., Law, V.J.

A principal component analysis (PCA) of plasma-generated harmonics monitored using a non-invasive ex-situ probe is reported. PCA trends due to gas pressure and RF power were demonstrated. Changes in...

Quasi-one dimensional transport in semiconductor microstructures (1992)

Kelly, M J, Potts, A, Hamilton, A, Tewordt, M, Pepper, M, Law, V J, ...

We describe some of the physics peculiar to electron transport in quasi-one-dimensional systems in semiconductors, with particular reference to three systems in which it has been investigated:...

Quasi-one dimensional transport in semiconductor microstructures (1992)

Kelly, M J, Potts, A, Hamilton, A, Tewordt, M, Pepper, M, Law, V J, ...

We describe some of the physics peculiar to electron transport in quasi-one-dimensional systems in semiconductors, with particular reference to three systems in which it has been investigated:...

Quasi-one dimensional transport in semiconductor microstructures (1992)

Kelly, M J, Potts, A, Hamilton, A, Tewordt, M, Pepper, M, Law, V J, ...

We describe some of the physics peculiar to electron transport in quasi-one-dimensional systems in semiconductors, with particular reference to three systems in which it has been investigated:...