V. Yanev

Details der Publikationsliste

Zeitraum

2004 - 2009

Anzahl

18

Co-Autoren

Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy (2009)

Weinreich, W., Wilde, L., Kücher, P., Lemberger, M., Yanev, V., Rommel, M., ...

Tunneling atomic force microscopy \'01TUNA\'02 is used to identify leakage current characteristics in SiO2 doped ZrO2 thin films within the nanometer scale. TUNA current maps and local TUNA I-V...

Experimental observation of FIB induced lateral damage on silicon samples (2009)

Spoldi, G., Beuer, S., Rommel, M., Yanev, V., Bauer, A.J., Ryssel, H.

Scanning spreading resistance microscopy (SSRM) and scanning capacitance microscopy (SCM) were used to analyze focused ion beam (FIB) induced lateral damage around milled structures on silicon. For...

Comparative study between conventional macroscopic IV techniques and advanced AFM based methods for electrical characterization of dielectrics at the nanoscale (2009)

Yanev, V., Erlbacher, T., Rommel, M., Bauer, A.J., Frey, L.

High-k dielectrics exhibit strong variations in their electrical characteristics on the nanometer scale due to morphology alteration. Therefore, electrical measurement techniques with nanometer...

SSRM characterisation of FIB induced damage in silicon (2008)

Beuer, S., Yanev, V., Rommel, M., Bauer, A.J., Ryssel, H.

Scanning spreading resistance microscopy (SSRM) has been applied to study focused ion beam (FIB) induced damage in silicon in dependence on ion irradiation doses from 10(exp 12) cm-2 to 2·10(exp 16)...

Improved insight in charge trapping of high-k ZrO2/SiO2 stacks by use of tunneling atomic force microscopy (2008)

Paskaleva, A., Yanev, V., Rommel, M., Lemberger, M., Bauer, A.J.

In this work, tunneling atomic force microscopy (TUNA) is used to describe the charge trapping in high-k ZrO2 dielectric stacks at nanoscale dimensions by analyzing the alteration of the I-V curves...

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)

Yanev, V., Rommel, M., Lemberger, M., Petersen, S., Amon, B., Erlbacher, T., ...

High-k dielectric layers (HfSixOy and ZrO2) with different film morphologies were investigated by tunneling atomic-force microscopy (TUNA). Different current distributions were observed for amorphous...