W. Weinreich

Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy (2009)

Weinreich, W., Wilde, L., Kücher, P., Lemberger, M., Yanev, V., Rommel, M., ...

Tunneling atomic force microscopy \'01TUNA\'02 is used to identify leakage current characteristics in SiO2 doped ZrO2 thin films within the nanometer scale. TUNA current maps and local TUNA I-V...

Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition (2009)

Müller, J., Böscke, T.S., Schröder, U., Reinicke, M., Oberbeck, L., Zhou, D., ...

A broad compositional range of the dielectric material Zr1-xHfxO2 was evaluated with respect to its applicability in DRAM storage capacitors. The paper reports on phase composition, crystallization...

Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films (2009)

Weinreich, W., Reiche, R., Lemberger, M., Jegert, G., Müller, J., Wilde, L., ...

Polarity asymmetries in JSV and CSV characteristics of symmetrical MIM capacitors with amorphous and crystalline Zr(1\'02x)AlxO2 films and TiN electrodes are evaluated. Physical analysis of the...

Influence of the amorphous/crystalline phase of Zr1-xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks (2009)

Pakaleva, A., Lemberger, M., Bauer, A.J., Weinreich, W., Heitmann, J., Erben, E., ...

Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers (2009)

Weinreich, W., Ignatova, V.A., Wilde, L., Teichert, S., Lemberger, M., Bauer, A.J., ...

The influence of the annealing atmosphere and temperature on the crystalline phase and composition of thin ZrO2 layers grown by atomic layer deposition on silicon is analyzed. These physical...

Search for future high-k dielectrics, boundary conditions and examples (2009)

Bauer, A.J., Lemberger, M., Erlbacher, T., Weinreich, W.

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)

Yanev, V., Rommel, M., Lemberger, M., Petersen, S., Amon, B., Erlbacher, T., ...

High-k: Latest developments and perspectives (2008)

Bauer, A.J., Lemberger, M., Erlbacher, T., Weinreich, W.

Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics (2008)

Yanev, V., Rommel, M., Lemberger, M., Petersen, S., Amon, B., Erlbacher, T., ...

High-k dielectric layers (HfSixOy and ZrO2) with different film morphologies were investigated by tunneling atomic-force microscopy (TUNA). Different current distributions were observed for amorphous...

Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique: Poster at E-MRS Fall Meeting, September 17-21 2007, Warsaw (2007)

Yanev, V., Paskaleva, A., Weinreich, W., Lemberger, M., Petersen, S., Rommel, M., ...

Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique: Poster at E-MRS Fall Meeting, September 17-21 2007, Warsaw (2007)

Yanev, V., Paskaleva, A., Weinreich, W., Lemberger, M., Petersen, S., Rommel, M., ...